SPIE Photomask Technology + Extreme Ultraviolet Lithography Conference
ASML's Jan van Schoot will present "Scanner and mask requirements to support half field stitching" on Tuesday, September 8 at 11:00 a.m. Pacific time, followed by Intel Foundry's Kimberly Pierce, who will present "High NA EUV: stitching for manufacturing" at 11:20 a.m. in the same session.